Quantum Dots for MicroLEDs: Direct Nanoparticle Lithography for Next-Gen Energy Efficient Displays

Speaker: Dr. Danielle Chamberlin, CTO, NanoPattern Technologies

In-Person Meeting. Register: Here

Date and Time

Thurs June 20
11:30am: Networking & Pizza
  Noon-1PM: Seminar
     Cost: $4 to $6

Location

EAG Laboratories – 810 Kifer Road, Sunnyvale
                ==> Use corner entrance: Kifer Road / San Lucar Court
                ==> Do not enter at main entrance on Kifer Road

Quantum Dots for MicroLEDs: Direct Nanoparticle Lithography for Next-Gen Energy Efficient Displays

NanoPattern Technologies is developing inorganic nanoparticle photoresists to enable the next generation of energy-efficient electronics and displays. Using our photosensitive ligand technology, we have developed formulations to directly coat and pattern inorganic materials such as InP, CdSe, TiO2, and ZrO2 with no added vacuum or high-temperature annealing steps. Because the nanoparticles are not diluted in a polymer matrix, our inorganic photoresists achieve close to 70% volume loading and retain properties close to the pure, fully dense material. As a result, properties like high optical absorption or high refractive index can be achieved while avoiding the multiple costly fabrication steps of vacuum deposition processes. We will describe a focused application on the advantages of our InP quantum dot color converter photoresists to enable next-generation energy-efficient displays.
Read More: Direct Optical Lithography of Functional Inorganic Nanomaterial

About the Author:

Danielle Chamberlin, CTO at NanoPattern Technologies, holds a PhD and MS in Materials Science from UC Berkeley and an S.B. Degree in Materials Science from MIT.  She is an expert in optics and optoelectronics ranging from THz to the UV. Danielle has deep knowledge in the fields of LEDs and nanotechnology, having led down-converter R&D at Lumileds from 2009-2019.  She holds over 15 patents on topics ranging from biosensors to microLEDs.