Meyya Meyyappan, Honorary Professor, Indian Institute of Technology, Guwahati, India

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Printing of Next Generation Nanomaterial-based Electromagnetic Interference (EMI) Shields

Electromagnetic interference is now a routine concern, as emitted radiation from a device can interfere with the function of nearby systems. The radiation can also be harmful to human health. Thus, shielding regulations exist in industrialized nations for all electronic products. Most shields today are metal-based, and the weight penalty of metals becomes an issue as devices and systems shrink in size. More importantly, metals do their shielding job primarily by reflection due to their excellent conductivity and the resulting large impedance mismatch between the shield and free space. This leads to undesirable secondary pollution.
This talk will focus on two ongoing aspects of EMI shield development: First, the printing of shields which provides much thinner shields than what sheet metal fabrication can do. Shields based on alternatives to metals such as graphene and MXene are printed. Thinner shields translate to high absolute shielding effectiveness which is shielding effectiveness normalized to thickness and density. Printing also results in lower cost. Second, the talk will focus on green shields that work by absorption rather than reflection, aiming at a green index much greater than one, where green index is the ratio of absorbance over reflectance.
The author thanks Pranay Doshi, Daniel Gutierrez, Ram Gandhiraman, Hiu-Yung Wang, Sanjoy Sur Roy and P.K. Giri for their contributions.
Read More: MXene-PEDOT:PSS Nanocomposite-Based Electromagnetic Interference Shields with Ultrahigh Absolute Shielding Effectiveness

High green index electromagnetic interference shields with semiconducting Bi2S3 fillers in a PEDOT:PSS matrix

About the Author

Meyya Meyyappan, Honorary Professor at Indian Institute of Technology, Guwahati, India

Meyya Meyyappan recently retired from NASA Ames Research Center in Silicon Valley after serving as Chief Scientist for Exploration Technology and Director of the Center for Nanotechnology. He is currently an Honorary Professor at IIT-Guwahati, India. He has authored or co-authored over 440 articles in peer-reviewed journals and made over 300 Invited/Keynote/Plenary Talks in conferences across the world and over 300 seminars at universities. He is a Fellow of IEEE, AVS, ECS, MRS, ASME, AIChE, and National Academy of Inventors.
     For his contributions and leadership in nanotechnology, he has received numerous awards, including a Presidential Meritorious Award; NASA’s Outstanding Leadership Medal;  IEEE Judith Resnick Award; IEEE-USA Harry Diamond Award; AIChE Nanoscale Science and Engineering Forum Award; Distinguished Engineering Achievement Award by the Engineers’ Council; Pioneer Award in Nanotechnology by the IEEE-NTC; Sir Monty Finniston Award by the Institution of Engineering and Technology (UK); IEEE-USA Professional Achievement Award; AVS Nanotechnology Recognition Award; IEEE Nuclear and Plasma Sciences Society Merit Award; AVS Plasma Prize; MRS Impact Award; FLEXI Technology Champion Award for Printed and Flexible Electronics; ECS Thomas Callinan Award. For his sustained contributions to nanotechnology, he was inducted into the Silicon Valley Engineering Council Hall of Fame in 2009. He has received Honorary Doctorate from the University of Witwatersrand, Johannesburg, South Africa. He served as President of both IEEE Nanotechnology Council (NTC) and IEEE Electron Devices Society (EDS).
     For his educational contributions, he has received: Outstanding Recognition Award from the NASA Office of Education; the Engineer of the Year Award (2004) by the San Francisco Section of the American Institute of Aeronautics and Astronautics; IEEE-EDS Education Award; IEEE-EAB (Educational Activities Board) Meritorious Achievement Award in Continuing Education.

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