August 15th 2017: 2D Materials Advantages and Challenges Towards Applications
TITLE: 2D Materials Advantages and Challenges Towards Applications
SPEAKER:
Ching-Hua (Fiona) Wang, PhD. Student
Electrical Engineering Department, Stanford University
Tuesday, August 15, 2017 11:30 AM – 1:00 pm
Texas Instruments (TI) Auditorium E-1
2900 Semiconductor Drive
Santa Clara, CA map
Cost $6, discount for IEEE Members, Students & Unemployed. Please register here.
ABSTRACT:
Two-dimensional (2D) materials present unique opportunities for next generation ultra-thin electronics. However, practical 2D devices can only be realized after overcoming key challenges: contact resistance, stable doping, and uniform growth.
In this talk I will highlight the recent research our group has implemented to improve contact and doping in BP and MoS2 transistors. I will then show our work beyond transistor applications using 2D materials, such as graphene-Cu interconnects and hBN-RRAM, that are promising for three-dimensional integrated electronics.
- 11:30 am – Registration & light lunch (pizza & drinks)
- Noon – Presentation & Questions/Answers
- 1:00 pm – Adjourn